Join us
by webinar teleconference
(requires registration)
Seminars are held from 1:10pm
Date | Presenter | Topic | Abstract |
---|---|---|---|
4/30/2015 | Rene Claus | Quantitative Phase Measurement under Partially Coherent Illumination applied to EUV Mask Metrology | Abstract |
10/23/2014 | Shangliang Jiang | Image Processing Algorithms for Model-Based Fracturing with Shot Overlap | Abstract |
6/26/2014 | Yow-Gwo (Henry) Wang | Phase-Enhanced Defect Sensitivity for EUV Mask Inspection | Abstract |
4/3/2014 | Claire Baek | Real-time Inspection System Utilizing Scatterometry Pupil Data | Abstract |
1/30/2014 | Abde Ali Kagalwalla , UCLA | EUV Mask Defect Avoidance and Design Implications | Abstract |
11/21/2013 | Rene Claus , UCB | Phase and Amplitude Recovery of Mask Roughness using an EUV Microscope | Abstract |
01/26/11 | Prof. Tsu-Jae King-Liu , UCB | Impact of Random Variations on Tunnel FET Performance | Abstract |
02/09/11 | Prof. Fiona Doyle, UCB | Experimental testing of tribochemical model for copper CMP – the unexpected role of non-oxidative material removal | Abstract |
02/17/11 | BEARS | ||
02/23/11 | Dr. Rajasree Baskaran, Intel | Template based microchip assembly | Abstract |
03/05/11 | IMPACT 7th Workshop | ||
03/16/11 | Prof. Jane Chang, UCLA | Parameter Quantification for Predictive Feature Scale Modeling | Abstract |
03/30/11 | Prof. Costas Spanos, UCB | Integrated Circuit Variability | Abstract |
04/13/11 | Prof. Puneet Gupta, UCLA | Early and Systematic Co-Evaluation of Design Rules, Technologies and Layout Styles | Abstract |
04/27/11 | Prof. Andy Neureuther | Anticipating Lithography Variation in Design | Abstract |